Facilities
Nanoimprint Lithography (NIL) System
An Eitre 3 NIL System (Obducat, Sweden) hosted in a class 100 soft-wall clean room closure.Ìý
The equipment provides thermal embossing and step-and-flash nanoimprint, both independently and simultaneously.
The equipment provides precisely controlled temperature and pressure, with extremely uniform residual layer with pattern size down to 10 nm.Ìý
Ìý
Atomic Force Microscope (AFM)
Ìý ÌýNanoscope IV SPM from Bruker.Ìý This system is based on Veeco’s SPM model Dimension 3100.
Ìý ÌýEquipped with both open-loop and close-loop heads.
Ìý
Nanoscale Thermal Analysis (Nano-TA)
ÌýAnasys Nano-TA 2 system (now Bruker)Ìý Ìý ÌýÌý
Coupled with the AFM equipment.Ìý
Provide measurements of Tg or TmÌýwith nanoscale resolution (up to 450 oC)Ìý Ìý Ìý ÌýÌý
Ìý
Dynamic Mechanical Analysis (DMA)
TA Instrument, Q800 model
Ìý
Rheometer
TA Instrument, AR-G2 Model
Ìý
Differential Scanning Calorimetry (DSC):ÌýÌýDSC 204 F1 NETZSCH, Germany
Ìý
Collimated UV curing system
Ìý Ìý6986 EXFO OMNI¶¶ÒõÂÃÐÐÉäRE S2000 UV ¶¶ÒõÂÃÐÐÉäRE
Ìý
Microscope Hot Stage
Instec STC 200 model
Ìý
Membrane Filtration Capabilities
Our labÌýhas extensive filtration equipment and facilities for membrane research, including:
- Varies of bench scale, stirred dead-end filtraiton cells with pressure up to 1000 psi
- Liquid cells suitable for both diffusion and pressure-driven crossflow or normal flow up to 400 psiÌý
- Low (up to 200 psi) and high (1000 psi) pressure bench scale crossflow membrane units
- Direct contact membrane distillation (DCMD) setup
- Gas permeation measurement setup for common gases